Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.13, No.2, 476-480, 1995 DOI10.1116/1.579382 Export Citation Plasma-Enhanced Chemical-Vapor-Deposition of SiO2 Using Novel Alkoxysilane Precursors Bogart KH, Dalleska NF, Bogart GR, Fisher ER Keywords:SILICON-OXIDE FILMS;THIN-FILMS;TEOS;TETRAETHOXYSILANE;DECOMPOSITION;SIO2-FILMS;DIOXIDE [Referenced By] Please enable JavaScript to view the comments powered by Disqus.
