Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.13, No.3, 1027-1031, 1995 DOI10.1116/1.579578 Export Citation A Novel Technique for Characterizing the Surface Coverage of Thin-Film Chemical-Vapor-Deposition in Ultra-High-Aspect-Ratio Microstructures Soave RJ, Tasker GW, Then AM, Mayer JW, Shachamdiamand Y Please enable JavaScript to view the comments powered by Disqus.
