Journal of Vacuum Science & Technology A, Vol.13, No.6, 2914-2919, 1995
Plasma Chemical-Vapor-Deposition and Properties of Hard C3N4 Thin-Films
Compact thin films of stoichiometric, amorphous C3N4 have been prepared by means of chemical transport of carbon in intense nitrogen glow discharge at relatively high deposition temperature of about 800 degrees C. Their hardness reached 2500 Vickers (kg/mm(2)).