화학공학소재연구정보센터
Journal of Vacuum Science & Technology A, Vol.14, No.4, 2680-2680, 1996
Dynamic Rate and Thickness Metrology During Poly-Si Rapid Thermal Chemical-Vapor-Deposition from SiH4 Using Real-Time in-Situ Mass-Spectrometry (Vol 14, Pg 267, 1996)