Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology A, Vol.14, No.5, 2970-2972, 1996 DOI10.1116/1.580255 Export Citation Effect of Oxygen on Methyl Radical Concentrations in a CH4/H-2 Chemical-Vapor-Deposition Reactor Studied by Infrared Diode-Laser Spectroscopy Fan WY, Ropcke J, Davies PB Keywords:DISCHARGE CH4 PLASMA;RF-DISCHARGE;METHANE;DIAGNOSTICS;DENSITY;BAND Please enable JavaScript to view the comments powered by Disqus.
