Journal of Vacuum Science & Technology A, Vol.14, No.6, 3220-3223, 1996
Molecular-Beam Epitaxy Growth of CdTe on (211)A GaAs
CdTe has been grown on (211)A GaAs for the first time in the growth temperature range of 240-310 degrees C by molecular beam epitaxy. The quality and characteristics of the epitaxial film were studied by photoluminescence spectra, an x-ray double crystal rocking curve, a Nomarski interference microscope, add etching. High quality CdTe films were obtained. For our best film the full width at half maximum of the x-ray double crystal rocking curve was 126 arcsecond, and that of photoluminescence at 77 K was 8.9 meV. The epilayer was always (211)A CdTe with a tilted angle of about 2 degrees around CdTe[0(1) over bar1$]parallel to GaAs[0(1) over bar1$] with respect to the substrate. A model of the initial growth stage of CdTe on (211)A GaAs is presented.
Keywords:GAAS(100)