화학공학소재연구정보센터
Journal of Vacuum Science & Technology A, Vol.16, No.2, 429-435, 1998
Studies of metallic multilayer structures, optical properties, and oxidation using in situ spectroscopic ellipsometry
In situ spectroscopic ellipsometry (SE) has been successfully used to accurately measure sputter deposition rates and optical constants of un-oxidized metal layers and to control the growth of magnetic multilayers. The structures include [Co/Cu](n), [Co/Au](n), [Co/Ni](n), [Co/Pd](n) and [Co/Pd/ Au](n). Layer thickness precision is better than +/-0.05 nm for layer thicknesses in the range of 0.2 nm to 10 nm. Closed-loop feedback control of layer thickness is also demonstrated. Good consistency was obtained by comparing the in situ SE results to x-ray diffraction measurements. Dynamic oxidation studies of [Co/Au](n) and [Co/Ni](n) multilayer structures are also presented.