Journal of Vacuum Science & Technology A, Vol.17, No.4, 1364-1368, 1999
Complete solvent free stripping of via structures using NF3/H2O/O-2 ashing chemistry
The objective of this study is to develop a via post-strip cleaning process which would utilize non-hydroxylamine (HDA) based solvent, thereby reducing possibility of corrosion in the via and also reducing the cost of chemicals and waste disposal expenses. The work resulted in the development of a 100% solvent-less process which matches the performance of HDA-based solvents but totally eliminates chemical costs and waste-disposal expenses removes the hazards of working with hot hazardous solvents; avoids corrosion which is common with HDA-based solvents; and thereby facilitates more efficient utilization of costly clean-room space; The new ash process in combination with a post-ash DI water rinse has been demonstrated to be effective at removing polymer inside vias and achieving via resistances comparable to standard oxygen ash + HDA wet solvent stripping.