Facile cathode metal patterning is immensely vital these days as sensor embedded or transparent OLED device applications. In this study, we report a self-metal patterning method by controlling the surface energy of beneath layer and metal thermal deposition temperature in the patterning layer/metal structure in OLED evaporation process. In order to realize the self-metal patterning, a metal patterning layer (MPL) was introduced before the metal deposition which has the property of inhibition of metal deposition by the control of surface energy. Among several MPLs, a low surface energy material of CBP (4,40-bis (N-carbazolyl)-1,10-biphenyl) shows a good self-metal patterning of low deposition temperature Mg metal. Whereas, the lowest surface energy materials of PFTC (polyfluoro-tetracosane) results in excellent patterning properties in both Mg as well as high source evaporation temperature metal Ag. Our self-metal patterning technology could be very useful for upcoming numerous electronic applications.