Journal of Vacuum Science & Technology A, Vol.17, No.6, 3308-3311, 1999
Study of CN films synthesized by facing target sputtering
CN films were made by a facing target sputtering system. X-ray diffraction, x-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy and Raman spectroscopy spectra were measured to investigate the structure and the binding state of the film. The films an amorphous and the N/C increases as the N-2 partial pressure increases and it reaches 0.46 when the N-2? pressure is 100%. The N incorporated C forms N-sp(2) C and N-sp(3) C mainly and there is a small amount of C drop N. The incorporated N causes structural disorder of the C films and a reduction in the friction coefficient of the films.
Keywords:CARBON NITRIDE FILMS;ENERGY NITROGEN IMPLANTATION;MECHANICAL-PROPERTIES;AMORPHOUS-CARBON;THIN-FILMS;RAMAN-SCATTERING;VAPOR-DEPOSITION;GRAPHITE;SPECTROSCOPY