Journal of Vacuum Science & Technology B, Vol.11, No.6, 2397-2399, 1993
Use of a Variable Shaped Beam Electron Lithography System for Diffractive Optics Components Manufacturing
Binary diffractive optical components using 1-3 mask levels are being manufactured with a variable shaped electron beam system with "write on the fly" writing mode, which is also used for conventional microelectronic applications. Two examples of components are described.