Metrology test reticles that include a wide variety of structures typically encountered on phase-shifting masks were fabricated using a subtractive process. The test masks have been used to assess the ability of metrology instruments to measure linewidth, height, edge slope, roughness, critical dimension uniformity, and placement of the various submicron chromium and quartz features. Results demonstrating the resolution, accuracy, and repeatability of each instrument are presented for different types of phase-shifting mask features.