Fresnel phase zone plates for hard x-ray microfocusing have been fabricated. An original x-ray mask written by e-beam lithography was replicated into thick PMMA by x-ray proximity printing. The pattern was transferred into gold and nickel by electroplating. A smallest linewidth of 0.25 mum with an aspect ratio of 14 in the metal pattern has been achieved. Thickness of fabricated zone plates was dictated by a pi-phase shift requirement for focusing of the x rays at 8 and 20 keV energies.