In this article, a novel optimization program applicable to chemically amplified resist (CAR) process development, which is based on the method named as chemically amplified resist process optimization design developed in CXrL, is described. This program is separated as three subprograms. The first program called VERTICES is used to find most efficient sampling space. The second program called OPTIM1 is used to find the optimal process conditions. The third program called OPTIM2 is used to find the design center (maximum process tolerance space) of a CAR process with minimum experimental runs. In this article, the process optimization of AZ PF-514 has been used as an example to show that the program can identify the optimal process condition as well as the maximum tolerable parameter space with minimum experimental runs.