Depth-of-focus (gap latitude in proximity lithography) and exposure latitude are the two most important figures-of-merit for linewidth control in lithography. In a recent article, the preliminary result of the experimental verification of this theoretical study was presented-the linewidth variation as a function of gap. In this article, the experimental results of the exposure latitude are presented and discussed. Excellent agreement between experimental and simulation results are found. Optimized parameters based on verified model are presented here.