Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3208-3213, 1994 DOI10.1116/1.587501 Export Citation Reactive Ion Etching of RuO2, Thin-Films Using the Gas-Mixture O-2 Cf3Cfh2 Pan W, Desu SB Keywords:DIFFUSION-BARRIERS;OXYGEN;MICROSTRUCTURE;RUTHENIUM Please enable JavaScript to view the comments powered by Disqus.
