Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3270-3274, 1994 DOI10.1116/1.587610 Export Citation Atomic-Hydrogen Resist Process with Electron-Beam Lithography for Selective Al Patterning Masu K, Tsubouchi K Keywords:ALUMINUM;DEPOSITION;SURFACE Please enable JavaScript to view the comments powered by Disqus.
