Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3388-3392, 1994 DOI10.1116/1.587518 Export Citation Magnetically Confined Plasma Reactive Ion Etching of GaAs/AlGaAs/AlAs Quantum Nanostructures Song YP, Wang PD, Torres CM, Wilkinson CD Keywords:GAAS;SEMICONDUCTORS;DISCHARGES;SURFACE;DAMAGE Please enable JavaScript to view the comments powered by Disqus.
