Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3550-3554, 1994 DOI10.1116/1.587469 Export Citation An Industrial Plasma Process for Avoiding Charge Effect Romand P, Weill A, Panabiere JP, Prola A Keywords:ELECTRON-BEAM LITHOGRAPHY;LAYERS Please enable JavaScript to view the comments powered by Disqus.
