Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3699-3703, 1994 DOI10.1116/1.587643 Export Citation In-Situ GaAs/AlGaAs Patterning Using a Thin Epitaxial InGaAs Layer Mask as a Negative-Type Electron-Beam Resist in Cl-2 Gas Kohmoto S, Sugimoto Y, Takado N, Asakawa K Keywords:CL2 GAS;GAAS;LITHOGRAPHY;INAS Please enable JavaScript to view the comments powered by Disqus.
