Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3773-3777, 1994 DOI10.1116/1.587440 Export Citation An Increased Effective Depth of Focus at Contact Mask for Nonvolatile Memories Using an Enhanced Planarization Scheme Cork C, Bacchetta M Please enable JavaScript to view the comments powered by Disqus.
