Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3783-3792, 1994 DOI10.1116/1.587442 Export Citation Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase-Shifting Masks with Optimized Illumination Ronse K, Pforr R, Baik KH, Jonckheere R, Vandenhove L Please enable JavaScript to view the comments powered by Disqus.
