Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.12, No.6, 3884-3887, 1994 DOI10.1116/1.587568 Export Citation Photoresist Channel-Constrained Deposition of Electroless Metallization on Ligating Self-Assembled Films Calvert JM, Calabrese GS, Bohland JF, Chen MS, Dressick WJ, Dulcey CS, Georger JH, Kosakowski J, Pavelcheck EK, Rhee KW, Shirey LM Keywords:LITHOGRAPHY Please enable JavaScript to view the comments powered by Disqus.
