Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.13, No.1, 118-124, 1995 DOI10.1116/1.588003 Export Citation Role of Ions in Electron-Cyclotron-Resonance Plasma-Enhanced Chemical-Vapor-Deposition of Silicon Dioxide Seaward KL, Turner JE, Nauka K, Nel AM Keywords:LOW-TEMPERATURE DEPOSITION;MICROWAVE PLASMA;OXIDE FILMS;ENERGY;CVD;STREAM;SIO2 [Referenced By] Please enable JavaScript to view the comments powered by Disqus.
