Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.13, No.2, 192-197, 1995 DOI10.1116/1.587996 Export Citation Investigation of Silicon Transport in the Neutral Background of a Plasma Activated Reactive Evaporation System Higgins B, Durandet A, Boswell R Keywords:ASSISTED DEPOSITION;THIN-FILMS;TEMPERATURE;COATINGS Please enable JavaScript to view the comments powered by Disqus.
