Journal of Vacuum Science & Technology B, Vol.13, No.3, 954-961, 1995
In-Situ Diode-Laser Absorption-Measurements of Plasma Species in a Gaseous Electronics Conference Reference Cell Reactor
Keywords:FREQUENCY-MODULATION SPECTROSCOPY;ATOMIC CHLORINE CONCENTRATION;ETCHING REACTOR;CF2;WAVELENGTH;DISCHARGES;EMISSION;BANDS