Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.13, No.3, 1058-1060, 1995 DOI10.1116/1.587903 Export Citation Effect of an Al2O3 Interlayer on Linewidth Control in Electron-Beam Writing on Tungsten Substrates Moel A, Gomei Y, Sugihara S, Takigami Y Keywords:X-RAY MASK;LITHOGRAPHY;REDUCTION;FILMS Please enable JavaScript to view the comments powered by Disqus.
