We present an efficient method to define arbitrarily chirped distributed feedback gratings giving differences between neighboring effective distributed feedback pitch lengths in the range of subinteratomic distances. Using bent waveguides superimposed on homogeneous distributed feedback grating fields, distributed feedback gratings with arbitrary chirping in the axial direction can be generated by appropriate bending functions. The bending functions are generated by high resolution electron-beam lithography on a set of masks which can be frequently reused for a low-cost production process. We describe the design principles to enhance the device yield per wafer by defining specific unit cells which are reproduced as often as necessary to obtain full coverage of the wafer. The method can be applied to several crystalline, amorphous, or polycrystalline solid-state materials such as inorganic or organic semiconductors, inorganic or organic dielectrics, glass, and polymers. Our method will be demonstrated for distributed feedback grating based photonic inorganic semiconductor devices.