Journal of Vacuum Science & Technology B, Vol.14, No.3, 1864-1866, 1996
Calculation of Etching Profile in the Photolithographic Process on As2S3 Thin-Films
The model of the formation etching profile in the photolithographic process on the As2S3 thin films has been proposed. Using experimental dependence of dissolution rate versus exposure the evolution of the etching profile was calculated. The model allows one to predict the etching profile and simulates the process.