Projection Lithography at 157 nm is a candidate technology for the 100-70 nm generations, and possibly beyond. It would provide an evolutionary extension to the current primary photolithographic processes and components: excimer lasers, refractive optics, and transmissive masks. This article presents data on the transmission of optical materials at 157 nm, the performance of optical coatings, the issues that must be faced by photomasks, and the considerations related to engineering resists at this wavelength.