Damage introduced from sputtering deposition, electron-beam evaporation, and thermal evaporation were investigated with an InGaAs/GaAs strained quantum well structure. This strained quantum well structure was found to be a more sensitive probe of damage, revealing metallization-induced damage where none was found using comparable lattice-matched quantum wells. The damage was found to vary with deposition method, deposition rates, or even different metal sources used. Noticeable degradation of the photoluminescence of the strained quantum well was observed after a thin layer (similar to 100 Angstrom) of metal was deposited.