Different 1995-1996 ultraviolet (UV) grade experimental fused silica samples were evaluated for their resistance to UV-induced compaction at 193 nm under elevated sample temperature conditions. We found that the compaction rate decreases with increasing sample temperature. Compaction recoveries were observed at temperatures as low as 120 degrees C, this suggests that the recovery of UV-induced compaction in fused silica is a thermally excited process with a low activation energy. Isothermal annealing experiments were performed on two different sets of precompacted fused silica samples. An activation energy of 0.13 eV was found for both cases.