We have developed a simple lithographic technique for repairing damaged chips, even after the end of the whole fabrication process, by using simply a light microscope for lithographic definition. In the usual laboratory; practice, it can happen that the fabricated chips present defects which make them useless, such as: broken metallic lines, or unwanted contacts between close elements on the same layer. Repairing these defects requires that the damaged area is lithographically defined in the photoresist,;so that a subsequent step of film deposition (for broken lines) or etching (for unwanted contacts) can be performed. The white illumination of a usual light microscope with a reduced field (by means of a diaphragm already present in the microscope optical path) can provide the necessary light source to expose-the resist. Both spots and narrow lines (several microns wide)can be defined in the resist; we give the details of operation and show some examples from our devices.