Experiments were carried out to manufacture aspheric surfaces to extreme ultraviolet (EUV) standards, within the European Project extreme UV concept lithography development system (EUCLIDES). Results of the fabrication of mirror 2 of the Sandia National Laboratory 5 x ring-field system will be discussed. A residual rms surface error of 0.14 nm and a roughness of 0.2 nm have been achieved. These results are very promising for the realization of future EUV systems.