Journal of Vacuum Science & Technology B, Vol.17, No.6, 3335-3338, 1999
Study of resolution limits due to intrinsic bias in chemically amplified photoresists
This article presents experimental results that suggest that classical Fickian diffusion cannot account for any significant fraction of the critical dimension bias observed in chemically amplified photoresists. A transport mechanism based on reaction front propagation is proposed as a possible explanation for the experimental observations.