Journal of Vacuum Science & Technology B, Vol.18, No.1, 122-126, 2000
Thermostable trilayer resist for niobium lift-off
We have developed a novel lift-off process for fabrication of high quality superconducting submicron niobium structures. The process makes use of a thermostable polymer with a high transition temperature T-g = 235 degrees C and an excellent chemical stability. The superconducting critical temperature of 150-nm-wide niobium lines is above 7 K. An example of shadow evaporation of a Nb-Cu submicron hybrid structure is given. A potential application of this process is the fabrication of very small single electron devices using refractory metals.