Zinc oxide film is a promising material for the transparent electrode and color development laser in the ultra violet region. This zinc oxide film has been prepared from DEZ and oxygen with plasma CVD without doping. The deposited film shows c-axis orientation with more than 300 degrees C of substrate temperature. The film grows from a triangular pyramidal shape to hexagonal plate shape crystals. The minimum resistance is found to be 4.55 x 10(-3) Omega . cm.