Macromolecules, Vol.27, No.19, 5498-5503, 1994
Plasma Modification of Poly(Ether Sulfone)
Surface treatment of poly(ether sulfone) by O2, H-2, He, Ne, Ar, and CF4 nonisothermal glow discharges has been investigated by X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The chemical and topographical modification of the surface is found to be strongly influenced by the type of feed gas employed.
Keywords:GLOW-DISCHARGE MODIFICATION;RF DISCHARGE;POLYMER CHEMISTRY;ELECTRON-ENERGY;SURFACE;ARGON;ESCA;CF4;POLYETHYLENE;POLYSTYRENE