화학공학소재연구정보센터
Materials Research Bulletin, Vol.29, No.2, 195-202, 1994
Electrochemical Preparation and Characterization of Copper Indium Diselenide Thin-Films
Thin polycrystalline CuInSe2 films were cathodically deposited on titanium and SnO2 coated glass at potentials ranging from -350 MV to -750 mV vs SCE from aqueous sulphate bath using citric acid as complexing agent. The films were annealed at 425-degrees-C in an argon atmosphere and characterised by X-ray diffraction and EPMA. From the XRD analysis the structure of the film was found to be tetragonal. The composition of the as deposited film was found to be 1:1:2 by EPMA. From the optical studies the band gap was found to be 1.02 eV. All the as deposited films were found to be p-type. On post heat treatment at 425-degrees-C the films deposited at or above -650 mV changed to n-type whereas below -650 mV p-type films only were obtained.