Negative photoresists based on poly(vinyl phenol) (PVP) have been developed using bis(perfluorophenyl azides). Examples of bisPFPAs include 1,5-bis(4＇-azido-2＇,3＇,5＇,6＇-tetrafluorophenyl)-1,4-pentadiene-3-one (4) and 2,6-bis(4＇-azido-2＇,3＇,5＇,6＇-tetrafluorophenylmethylene)-4-methylcyclohexanone (5). The use of long wavelength bisPFPAs makes it possible to carry out crosslinking reactions at near UV region (around 350 nm). These bisPFPAs exhibit high crosslinking efficiencies towards PVP. Addition of only 1.8 wt% of the crosslinker to PVP gave more than 70% of film retention after development. PVP resists containing 3.6 wt% of bisPFPA yield films with 95% retention. (C) 2000 Elsevier Science B.V. All rights reserved.