The optical properties of surface-relief gratings, structured on a submicrometer scale, were investigated by effective-medium approaches and by rigorous diffraction theory. Linear and crossed surface-relief gratings in photoresist were prepared on relatively large areas with a holographic process. From the photoresist gratings, nickel masters were produced and then used for an embossing process. With this process, the surface-relief gratings were transferred into an ORMOCER film on a glass pane. The angle-dependent transmittance and the reflectance of glass panes coated with structured ORMOCER films were measured. Transmittance values of more than 98% can be achieved.