Thin Solid Films, Vol.240, No.1-2, 116-120, 1994
Characterization of Al-Doped N-Type ZnSe Prepared Under a Zinc-Rich Growth Condition by Low-Pressure Organometallic Chemical-Vapor-Deposition
High conductivity n-type ZnSe with rho = 0.01 OMEGA cm and n = 2.4 x 10(18) cm-3 is obtained on (100) GaAs substrates by low pressure organometallic chemical vapor deposition. The 14 meV full width at half maximum of the 77 K photoluminescence near-band-edge emission shows a high quality of as-grown Al-doped ZnSe epilayers. With a suitable Al doping level, a strong photoluminescence intensity of near-band-edge emission is obtained. The behavior of near-band-edge emission and of self-activated emission related to the incorporation of aluminum are discussed in this paper.
Keywords:MOLECULAR-BEAM EPITAXY;MOVPE