Self-assembled monolayer patterns have been fabricated on silicon dioxide/silicon substrates by a chemical adsorption (CA) technique from 18-nonadecenyltrichlorosilane, 9-(heptadecafluorodecyl-dimethylsilyl)nonyltrichlorosilane etc. and a selective electron beam irradiation in a nitrogen atmosphere through an SUS mask. The fabrication of CA monolayer patterns was well confirmed by an X-ray photoelectron spectroscopy measurement, a contact angle measurement and film thickness measurement. A fine line and space pattern are fabricated in this study.