Thin Solid Films, Vol.245, No.1-2, 60-63, 1994
Epitaxial BaF2 Films on InP(100) Deposited by RF Magnetron Sputtering
Epitaxial BaF2 thin films were deposited onto InP(100) at a substrate temperature ranging from 450 to 480-degrees-C by r.f. magnetron sputtering. X-ray diffraction analysis revealed a pure c-axis-oriented film perpendicular to the substrate surface. The X-ray rocking curve of the full width at half-maximum for BaF2(200) was less than 0.8-degrees. The X-ray pole figure investigation showed good in-plane alignment of the crystals. A scanning electron microscopy surface scan indicated a highly textured film with grid growth morphology.
Keywords:FLUORIDE FILMS;GROWTH