Thin Solid Films, Vol.253, No.1-2, 179-184, 1994
Electrostatic-Based Model for Alumina Surfaces
As most technologically important metals will form oxides readily, any complete study of adhesion at real metal surfaces must include the metal-oxide interface. The role of this ubiquitous oxide layer cannot be overlooked, as the adhesive properties of the oxide or oxide-metal system can be expected to differ profoundly from the adhesive properties of a bare metal surface. We report on the development of a novel computational method for molecular dynamics simulations which explicitly includes variable charge transfer between anions and cations. This method is found to be capable of describing the elastic properties, surface energies, and surface relaxation of crystalline metal-oxides accurately. We discuss in detail results using this method of alpha-alumina and several of its low index faces.
Keywords:EMBEDDED-ATOM-METHOD;MOLECULAR-DYNAMICS SIMULATIONS;ELECTRONEGATIVITY EQUALIZATION;FCC METALS;SILICON;ORDER