The microwave plasma-assisted chemical vapor deposition (CVD) technique has been used to grow a polycrystalline diamond thin film over silicon substrate. Reactant gases of methane and hydrogen were used in the diamond CVD process. We have performed a feasibility test on the possible applicability of diamond and diamond-like carbon thin films for space protective applications against artificially simulated hypervelocity impact of micrometeoroid particles of olivine. As-deposited films were analyzed by Raman and scanning electron microscopy for their chemical nature and morphology respectively.