The grain size and the recrystallization of some transition metal nitride films as well as of multilayer and alloyed films were investigated by electron microscopy. These films were obtained by are evaporation in an atmosphere of nitrogen. The influence of film thickness in the range of 0.1-2 mu m, alloying and layer number on grain size is described. The change of grain size at annealing (T=673-1273 K) is also analysed. The recrystallization temperature decreased with decreasing film thickness. The recrystallization rate is lowered in the multilayer films.