화학공학소재연구정보센터
Thin Solid Films, Vol.263, No.1, 122-126, 1995
Relations Between Structural and Electronic-Properties of SnO2 Polycrystalline Thin-Films Prepared by the Aerosol MOCVD Technique
Thin polycrystalline films of undoped SnO2 have been prepared by aerosol metal-organic chemical vapour deposition on single-crystal MgO(100) and glass ceramic substrates at deposition temperatures T-s = 300-800 degrees C. From electrical and X-ray diffraction measurements, the effect of substrate nature and T-s on the electronic and structural parameters was studied. The size of crystalline grains and their bulk electrophysical characteristics were weakly dependent on the substrate nature and T-s. At the same time, preferential grain orientation and subsequently film texture character were determined by the above-mentioned factors. The observed behavior of the film’s electrical properties and gas sensitivity was attributed to a variation of texture character.