Previous Article Next Article Table of Contents Thin Solid Films, Vol.281-282, 404-408, 1996 DOI10.1016/0040-6090(96)08692-0 Export Citation Surface-Properties of SiOx Monolayer Photochemically Formed on Oxide Semiconductors Tada H, Tanaka M A novel method for preparing SiOx(2 Please enable JavaScript to view the comments powered by Disqus.
