Lead titanate thin films were deposited on Pt substrates. When a sintered oxide target of stoichiometric composition was used, the content of lead in the film was less than that of the target. This suggests that the content of lead at the surface of the target decreases in the course of sputtering. In order to increase the lead on the target surface, metallic lead was evaporated onto the target during ion-beam sputtering. The effect of Pb evaporation and oxygen partial pressure on the crystal structure of the films was studied. Perovskite films were obtained with controlled evaporation of metallic lead.